Materials Processing and Fabrication - Revision history

Cmditradmin: /* Ohmic contact */

2011-06-22T22:21:13Z

Ohmic contact

← Older revision		Revision as of 15:21, 22 June 2011
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	=== Ohmic contact ===		=== Ohmic contact ===
			An intimate metal contact with a semiconductor such that the current voltage curve is linear and symmetric. This is typically created with a vacuum deposited metal coating.

	=== Schottky contacts ===		=== Schottky contacts ===

Cmditradmin: /* Spin Coating */

2010-11-22T20:26:53Z

Spin Coating

← Older revision		Revision as of 13:26, 22 November 2010
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	==Crystallization and Deposition Techniques==		==Crystallization and Deposition Techniques==

	=== Spin ~~Coating~~ ===		=== [[Spin coater]] ===
	~~see Wikipedia [http://en.wikipedia.org/wiki/Spin_coating Spin Coating]~~

	===Physical ===		===Physical ===

Cmditradmin: /* Patterning - Lithography */

2010-11-22T20:26:27Z

Patterning - Lithography

← Older revision		Revision as of 13:26, 22 November 2010
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	==Patterning - Lithography==		==Patterning - Lithography==

	~~=== [[Spin coater]] ===~~

	=== Photolithography ===		=== Photolithography ===

Cmditradmin: /* Spin Coating */

2010-11-22T20:25:38Z

Spin Coating

← Older revision		Revision as of 13:25, 22 November 2010
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	==Patterning - Lithography==		==Patterning - Lithography==

	=== Spin ~~Coating~~ ===		=== [[Spin coater]] ===

	=== Photolithography ===		=== Photolithography ===

Cmditradmin: /* Self Assembly */

2010-07-28T19:35:11Z

Self Assembly

← Older revision		Revision as of 12:35, 28 July 2010
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	[http://workbench.concord.org/database/activities/157.html Molecular Workbench simulation for electrostatic self assembly]		[http://workbench.concord.org/database/activities/157.html Molecular Workbench simulation for electrostatic self assembly]

	[http://~~mw2~~.concord.org/~~public~~/~~student~~/~~nano/self~~.~~cml~~ Self assembly nanotechnology]		[http://workbench.concord.org/database/activities/155.html Self assembly nanotechnology]

	==Patterning - Lithography==		==Patterning - Lithography==

Cmditradmin: /* Self Assembly */

2010-07-28T19:34:49Z

Self Assembly

← Older revision		Revision as of 12:34, 28 July 2010
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	[http://workbench.concord.org/database/activities/157.html Molecular Workbench simulation for electrostatic self assembly]		[http://workbench.concord.org/database/activities/157.html Molecular Workbench simulation for electrostatic self assembly]

			[http://mw2.concord.org/public/student/nano/self.cml Self assembly nanotechnology]

	==Patterning - Lithography==		==Patterning - Lithography==

Cmditradmin: /* Self Assembly */

2010-07-28T19:32:11Z

Self Assembly

← Older revision		Revision as of 12:32, 28 July 2010
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	=== Self Assembly ===		=== Self Assembly ===
	Current research into [[Self Assembled Materials]] is pointing to ways that thin layers can be built up in a highly organized manner. This provides more control of the dipole moment of applied surfaces.		Current research into [[Self Assembled Materials]] is pointing to ways that thin layers can be built up in a highly organized manner. This provides more control of the dipole moment of applied surfaces.

			[http://workbench.concord.org/database/activities/157.html Molecular Workbench simulation for electrostatic self assembly]

	==Patterning - Lithography==		==Patterning - Lithography==

128.95.39.187 at 16:48, 24 March 2010

2010-03-24T16:48:08Z

← Older revision		Revision as of 09:48, 24 March 2010
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	=== Bulk Crystal growth ===		=== Bulk Crystal growth ===



	=== Evaporation ===		=== Evaporation ===



	=== Sputtering ===		=== Sputtering ===



	=== doping ===		=== doping ===

			=== Micro-printing ===
	===
	Micro-printing ===

	===Chemical- epitaxial growth techniques===		===Chemical- epitaxial growth techniques===
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	Current research into [[Self Assembled Materials]] is pointing to ways that thin layers can be built up in a highly organized manner. This provides more control of the dipole moment of applied surfaces.		Current research into [[Self Assembled Materials]] is pointing to ways that thin layers can be built up in a highly organized manner. This provides more control of the dipole moment of applied surfaces.

			==Patterning - Lithography==

			=== Spin Coating ===

	~~==Patterning - Lithography==~~
	~~Spin Coating~~
	=== Photolithography ===		=== Photolithography ===
	negative process
	positive process		=== negative process ===
	soft lithography
	Lift - off process
	Resist processing		=== positive process ===

			=== soft lithography ===

			=== Lift - off process ===

			=== Resist processing ===

	Exposure		Exposure
	Nanoimprinting		Nanoimprinting
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	=== [[E-beam Lithography]]===		=== [[E-beam Lithography]]===

	X-ray lithography
			=== X-ray lithography ===

	=== Soft Lithography ===		=== Soft Lithography ===

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	== Metallization ==		== Metallization ==
	~~Ohmic contact~~

	~~Schottky contacts~~		=== Ohmic contact ===

	Annealing		=== Schottky contacts ===

			=== Annealing ===

	==Etching==		==Etching==

	=== wet etching ===		=== wet etching ===



	=== dry etching ===		=== dry etching ===



	=== plasma etching ===		=== plasma etching ===


	=== Rapid thermal processing ===		=== Rapid thermal processing ===

128.95.39.187: /* Physical */

2010-03-24T16:46:35Z

Physical

← Older revision		Revision as of 09:46, 24 March 2010
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	===Physical ===		===Physical ===
	~~Bulk Crystal growth~~

	~~Evaporation~~		=== Bulk Crystal growth ===

	~~Sputtering~~

	~~doping~~

	Micro-printing		=== Evaporation ===



			=== Sputtering ===



			=== doping ===


			===
			Micro-printing ===

	===Chemical- epitaxial growth techniques===		===Chemical- epitaxial growth techniques===
	Liquid phase epitaxy		Liquid phase epitaxy

128.95.39.187: /* Etching */

2010-03-24T16:46:02Z

Etching

← Older revision		Revision as of 09:46, 24 March 2010
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	==Etching==		==Etching==
	~~wet etching~~

	~~dry~~ etching		=== wet etching ===

	~~plasma etching~~
	~~Rapid thermal processing and annealing~~


			=== dry etching ===



			=== plasma etching ===


			=== Rapid thermal processing ===
			and annealing

	== Holography ==		== Holography ==